Asymmetrical strain distribution in sputtered TiN layers
نویسندگان
چکیده
منابع مشابه
Sputtered TiN films for superconducting coplanar waveguide resonators
S. Ohya,1, a) B. Chiaro,2 A. Megrant,2, 3 C. Neill,2 R. Barends,2 Y. Chen,2 J. Kelly,2 D. Low,2 J. Mutus,2 P. J. J. O’Malley,2 P. Roushan,2 D. Sank,2 A. Vainsencher,2 J. Wenner,2 T. C. White,2 Y. Yin,2 B. D. Schultz,1 C. J. Palmstrøm,1, 3 B. A. Mazin,2 A. N. Cleland,2 and John M. Martinis2, b) Department of Electrical and Computer Engineering, University of California, Santa Barbara, California...
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Morphology, structure, residual stress, and surface energy of magnetron-sputtered titanium nitride (TiN) thin films, deposited at 300 C with a thickness in the 0.5-1.7 lm range, were characterized. Film microstructure, the origin of residual stress, and its effect on the surface energy were analyzed. The grain size increased with the film thickness. X-ray diffraction showed (200) to (111) prefe...
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ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2000
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(00)00959-7